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XPS study of Ni49.54Mn29.59Ga20.87 magnetically driven shape memory alloy thin film fabricated by D.C magnetron sputtering technique

  • Lai Xu Gao*
  • , Chao Liu
  • , Zhi Yong Gao
  • , Xu An
  • , Wei Cai
  • , Lian Cheng Zhao
  • *Corresponding author for this work
  • HLJ University
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Ni49.54Mn29.59Ga20.87 magnetically driven shape memory alloy thin film has been deposited on silicon substrates by means of D.C magnetron sputtering technique. XRD pattern shows that the thin film is five-layered martensite phase at room temperature. The surface characteristics of the thin film are also investigated by X-ray electron spectroscopy (XPS). The results show that the film surface absorbs lots of O and C when it was put into air for 2 months. With the increasing of Ar+ sputtering depth, the contaminations of C element can be removed, but contaminations of O formed MnO exist in the film. The contents of Ni, Mn and Ga are increasing from the surface to inside, along with the transition from the ionic bonded atom to metal atom.

Original languageEnglish
Pages (from-to)50-52
Number of pages3
JournalGongneng Cailiao/Journal of Functional Materials
Volume38
Issue number1
StatePublished - Jan 2007
Externally publishedYes

Keywords

  • Magnetically driven shape memory alloy
  • Ni-Mn-Ga
  • Sputtering
  • Thin film

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