Abstract
Ni49.54Mn29.59Ga20.87 magnetically driven shape memory alloy thin film has been deposited on silicon substrates by means of D.C magnetron sputtering technique. XRD pattern shows that the thin film is five-layered martensite phase at room temperature. The surface characteristics of the thin film are also investigated by X-ray electron spectroscopy (XPS). The results show that the film surface absorbs lots of O and C when it was put into air for 2 months. With the increasing of Ar+ sputtering depth, the contaminations of C element can be removed, but contaminations of O formed MnO exist in the film. The contents of Ni, Mn and Ga are increasing from the surface to inside, along with the transition from the ionic bonded atom to metal atom.
| Original language | English |
|---|---|
| Pages (from-to) | 50-52 |
| Number of pages | 3 |
| Journal | Gongneng Cailiao/Journal of Functional Materials |
| Volume | 38 |
| Issue number | 1 |
| State | Published - Jan 2007 |
| Externally published | Yes |
Keywords
- Magnetically driven shape memory alloy
- Ni-Mn-Ga
- Sputtering
- Thin film
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