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Velocity-region dual adaptive path planning for ICP jet processing of ultra-thin optical elements

  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Over the past few years, atmospheric Inductively Coupled Plasma (ICP) has aroused extensive attention in optical fabrication field since its chemical etching-based processing mode does not mechanically damage work-pieces. However, the principle of chemical etching will inevitably bring some processing temperature while maintaining the efficiency. This makes the ICP jet easily cause thermal damage to the ultra-thin or low thermal conductivity optical elements, even cause the element to crack seriously. Therefore, this paper proposes a velocity-region dual adaptive path planning algorithm, which reduces the processing temperature by limiting the moving velocity of a single path, and achieves the removal of excessive peaks through Repeated traversals.

Original languageEnglish
Title of host publicationSeventh Asia Pacific Conference on Optics Manufacture, APCOM 2021
EditorsJiubin Tan, Xiangang Luo, Ming Huang, Lingbao Kong, Dawei Zhang
PublisherSPIE
ISBN (Electronic)9781510652088
DOIs
StatePublished - 2022
Event7th Asia Pacific Conference on Optics Manufacture, APCOM 2021 - Shanghai, China
Duration: 28 Oct 202131 Oct 2021

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume12166
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference7th Asia Pacific Conference on Optics Manufacture, APCOM 2021
Country/TerritoryChina
CityShanghai
Period28/10/2131/10/21

Keywords

  • ICP jet processing
  • Path planning
  • Ultra-thin optical elements
  • Velocity-region dual adaptive

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