UV/NaClO高级氧化法降解再生水中磺胺甲恶唑

The UV/NaClO advanced oxidation process was applied to degrade sulfamethoxazole (SMX) in order to improve reclaimed water quality. The effects of various degradation processes on SMX removal were compared. The factors influencing the decay of SMX by UV/NaClO process and the formation of disinfection by-products trichloromethane (CHCl ₃ ) were analyzed. The performance of the UV/NaClO process for degrading SMX in real reclaimed water was analyzed. Results show that the degradation rate constants of SMX in UV/NaClO process was respectively 3.9, 60 and 2.5 times faster than the method of UV, chlorination alone and UV/H ₂ O ₂ and the degradation conducted better at pH 3~8. The rate of SMX degradation peaked at oxidant dosage of 0.1 mmol/L at the conditions of 1μmol/L SMX and pH 7.4. Humic acid (HA) prevailing in secondary effluent of wastewater treatment plant and water environment decreased the SMX degradation by competing photons and active radicals with target contaminant. The less formation of trichloromethane was observed in UV/NaClO process compared with chlorination alone. The degradation rates observed in laboratory level was 6.8 times than that in real reclaimed water.