TY - GEN
T1 - UV-embossing process for replicating micro optical element with continuous relief structure based on thiol-ene polymer
AU - Jin, Peng
AU - Liu, Nan
AU - Wang, Guanxiong
PY - 2010
Y1 - 2010
N2 - UV-embossing process is a potential method for replicating micro optical element with continuous relief structure. Acrylate-based UV-induced polymer was traditional used, and there exists much limitation. In this paper, a novel thiol-ene was used in UV-embossing process as resist. And it can be shown in experiment that micro structure can be precisely replicated, and fabrication error is less than 3%. Meanwhile, the resistance of this material is well. Micro structure of MOE can be transferred into fused silica equally through reactive ion etching process. After etching process, the error is less than 5%. So it can be seen that the process is a proper method for fabrication of micro optical element.
AB - UV-embossing process is a potential method for replicating micro optical element with continuous relief structure. Acrylate-based UV-induced polymer was traditional used, and there exists much limitation. In this paper, a novel thiol-ene was used in UV-embossing process as resist. And it can be shown in experiment that micro structure can be precisely replicated, and fabrication error is less than 3%. Meanwhile, the resistance of this material is well. Micro structure of MOE can be transferred into fused silica equally through reactive ion etching process. After etching process, the error is less than 5%. So it can be seen that the process is a proper method for fabrication of micro optical element.
KW - Micro optical element
KW - Reactive ion etching
KW - Thiol-ene
KW - UV-embossing
UR - https://www.scopus.com/pages/publications/79952857253
U2 - 10.1109/AOM.2010.5713593
DO - 10.1109/AOM.2010.5713593
M3 - 会议稿件
AN - SCOPUS:79952857253
SN - 9781424483938
T3 - 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010
BT - 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010
T2 - 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics, AOM 2010
Y2 - 3 December 2010 through 6 December 2010
ER -