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Ultrafast carrier dynamics in SnOx thin films

  • Zhong Guo Li
  • , Lingyan Liang*
  • , Hongtao Cao
  • , Zhengguo Xiao
  • , Xingzhi Wu
  • , Yu Fang
  • , Junyi Yang
  • , Tai Huei Wei
  • , Ying Lin Song
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • CAS - Ningbo Institute of Material Technology and Engineering
  • Soochow University

Research output: Contribution to journalArticlepeer-review

Abstract

We studied the carrier dynamics in a series of SnOx thin films using femtosecond transient absorption (TA) spectroscopy. The observed carrier relaxation was found to be strongly dependent on thin film stoichiometry. The TA spectra corresponding to free carriers, trapped carriers, and state filling were observed in the picosecond time region for SnO2, SnOx, and SnO film, respectively. The TA decay kinetics of all films were best fit with a tri-exponential decay model with fast (1 ps), medium (∼10 ps), and slow (ns) components. Our results revealed the carrier relaxation and recombination processes in SnOx thin films, identifying the critical role of stoichiometry in photo-induced phenomena.

Original languageEnglish
Article number102103
JournalApplied Physics Letters
Volume106
Issue number10
DOIs
StatePublished - 9 Mar 2015

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