Ultra-smooth BaTiO₃ surface morphology using chemical mechanical polishing technique for high-k metal-insulator-metal capacitors

The surface roughness of barium titanate (BTO) following its implication by aerosol deposition method (ADM), is a very important characteristic affecting its potential for use in high-k metal-insulator-metal capacitors. The ADM is the best candidate to deposit ceramic films but has two major problems: macroscopic defects and rough interface effects on the BTO surface. In this work, a chemical mechanical polishing (CMP) technique is applied to obtain an ultra-smooth BTO surface morphology by the optimization of several factors including the slurry type, the head rotational speed, and the down pressure. Statistically, we were able to achieve a root mean square (RMS) value of the BTO surface of 1.746 nm by utilizing a two-step polishing process, applied at a head rotational speed of 70 rpm under 5 kg/cm² of down pressure; this RMS value is improved at least 8 times over previous studies. This analysis is based on representative pattern images, three-dimensional images, line profiles, histograms, and power spectra of selected BTO surface areas, further verified with data from both energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy.