TiO₂ ceramic films prepared by micro-plasma oxidation method for photodegradation of rhodamine B

Titanium dioxide ceramic films have been prepared on titanium board by the micro-plasma oxidation method. The influence of reaction voltage (120, 140, 160, 180, and 200V) on the structural and surface morphology of the film was investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The photocatalytic activity of the film was evaluated by the photodegradation of rhodamine B (Rh B). It was found that the films produced were microporous and consisted of crystalline titanium dioxide. The micropore size and the content of anatase and rutile TiO₂ phase increased with the applied voltage. The relatively higher degradation efficiency for Rh B was obtained in the film produced in the voltage of 160V.