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Time behavior and optimum conditions for the Xe gas extreme ultraviolet source

  • Yong Peng Zhao
  • , Qiang Xu*
  • , De Long Xiao
  • , Ning Ding
  • , Yao Xie
  • , Qi Li
  • , Qi Wang
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • IAPCM
  • CAS - Changchun Institute of Optics Fine Mechanics and Physics

Research output: Contribution to journalArticlepeer-review

Abstract

The time behavior and the optimum conditions for the Xe gas capillary discharge extrem ultraviolet source are investigated theo- retically and experimentally. By setting up a one-dimensional magneto-fluid-mechanics model, the plasma compressing characteristics and the emission characteristics are simulated under different gas pressures and different discharge currents. The time characteristic and the intensity of the 13.5 nm (2% bandwidth) emission are measured experimentally. The theoretical and experimental results show that there are the optimum gas pressures for different discharge currents. Meanwhile, the optimum gas pressure increases with the discharge current increasing. Moreover, the time to generate the highest 13.5 nm (2% bandwidth) emission should decrease by the increase of the discharge current. All the results should be useful to better understand the plasma condition for the discharge experiments and the EUV source. And it can be used to increase the power of the extreme ultraviolet source as well.

Original languageEnglish
Pages (from-to)245204
Number of pages1
JournalWuli Xuebao/Acta Physica Sinica
Volume62
Issue number24
DOIs
StatePublished - 2013

Keywords

  • Capillary discharge
  • Extreme ultraviolet source
  • Magneto-hydrodynamics
  • Xe plasma

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