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Thermal stability of multilayer tetrahedral amorphous carbon films

  • Xiao Han*
  • , Jiaqi Zhu
  • , Feng Zhou
  • , Xiaoli Chen
  • *Corresponding author for this work
  • China Aerospace Science and Technology Corporation
  • School of Astronautics, Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Using the filtered cathodic vacuum arc(FCVA) deposition technique with a process of changing substrate bias, a stable thick multilayer ta-C film was prepared. The multilayer films with a good adhesion consisted of alternating sp 2-rich sublayers A i and sp 2-rich sublayers B i (i=1, 2, 3). The sublayers thickness ratio d Ai/d Bi was about 1.0, and the total thickness of the multilayer film was about 1 prn. The calculated compressive stress of sublayers by the Stoney formula revealed an alternating wave change. After anealling at 500° in vacuum, the Raman spectra suggested the multilayer film had a non-changed sp 3-rich microstructure. The nanoindentation measurement showed an increasing hardness and Young's modulus of the multilayer film after annealing. The nanoscratch test showed the favourable scratch resistance and adhesive properties of multilayer film. The results indicate that the multilayer ta-C film has some excellent mechanical properties and thermal stability. The multilayer film is proper for the optical protective coatings for aeronautics and space applications.

Original languageEnglish
Pages (from-to)144-148
Number of pages5
JournalInfrared and Laser Engineering
Volume41
Issue number1
StatePublished - Jan 2012
Externally publishedYes

Keywords

  • Amorphou carbon
  • Multilayer films
  • Residual stress
  • Thermal stability

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