The tunable dielectric properties of sputtered yttrium oxide films

Yttrium oxide film is an important dielectric material, which has been widely used in the scientific and engineering fields. The microstructures of yttrium oxide films can be modified effectively by adjusting the substrate temperature and bias voltage, which also have effects on dielectric properties of yttrium oxide films. In this work, the dielectric properties of yttrium oxide films grown on Pt film, which exhibit the distinct microstructures with cubic-phase and monoclinic-phase domination manipulated by different substrate temperatures and bias voltages, have been investigated systematically. High substrate temperature as well as large bias voltage can decrease the loss tangent and enhance the dielectric constants up to 56 and 40, respectively. Furthermore, the driven force of temperature is more favorable than that of bias voltage for enhanced dielectric constant due to fewer defects.