@inproceedings{8ff2eebdbd3141d0ad875aa6bf9d6a6d,
title = "The Influence of the Afterglow Effects on the Average Substrate Current Density Growth in Short and Ultrashort High Power Impulse Magnetron Discharges",
abstract = "The high-power impulse magnetron sputtering (HiPIMS) represents a form of a pulse-periodic magnetron sputtering discharge that is able to provide higher degrees of sputtering material ionization. Thin films deposited by HiPIMS are much denser and having better adhesive properties comparing to dcMS, but the average deposition rates in HiPIMS are usually lower. Higher plasma ionization degree and the deposition rate decrease are interrelated. This relationship is explained by the fact that metal ions in the ionization region are back-attracted towards the target due to the potential drop over the ionization region. The back-attraction coefficient of ions is typically equal to 0.9. It means that 90\% of ions during the pulse are returning back to the target.",
author = "V. Igumnov and V. Kozhevnikov and A. Kozyrev and A. Solovyev and V. Oskirko and S. Rabotkin and V. Semenov and A. Pavlov",
note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 50th IEEE International Conference on Plasma Science, ICOPS 2023 ; Conference date: 21-05-2023 Through 25-05-2023",
year = "2023",
doi = "10.1109/ICOPS45740.2023.10481157",
language = "英语",
series = "IEEE International Conference on Plasma Science",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "ICOPS 2023 - 50th IEEE International Conference on Plasma Science",
address = "美国",
}