The FTIR studies of SnO2:Sb(ATO) films deposited by spray pyrolysis

B. Zhang; Y. Tian; J. X. Zhang; W. Cai

doi:10.1016/j.matlet.2011.01.052

The FTIR studies of SnO₂:Sb(ATO) films deposited by spray pyrolysis

B. Zhang
, Y. Tian
, J. X. Zhang
, W. Cai

Harbin Institute of Technology
Shandong University

Research output: Contribution to journal › Article › peer-review

67 Scopus citations

Abstract

Thin films of SnO₂:Sb were prepared by ultrasonic spray pyrolysis method. The role of antimony in the SnO₂ is demonstrated by FTIR. It is found that at low Sb concentrations, the Sb ions prefer to substitute Sn⁴⁺ in form of Sb⁵⁺. While beyond a certain Sb concentration, Sb ions start to be reduced to Sb³⁺, which have a negative effect on carrier concentration that, in turn, affects the reflectivity of SnO₂:Sb films. The increased disorder of SnO₂ at high Sb concentration is also shown by FTIR. The discussion of carrier scattering suggests that the ionized impurity and/or neutral impurity scattering are the dominant scattering mechanisms.

Original language	English
Pages (from-to)	1204-1206
Number of pages	3
Journal	Materials Letters
Volume	65
Issue number	8
DOIs	https://doi.org/10.1016/j.matlet.2011.01.052
State	Published - 30 Apr 2011
Externally published	Yes

Keywords

Defects
FTIR
Reflectivity
Structural
Thin films

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10.1016/j.matlet.2011.01.052

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title = "The FTIR studies of SnO2:Sb(ATO) films deposited by spray pyrolysis",

abstract = "Thin films of SnO2:Sb were prepared by ultrasonic spray pyrolysis method. The role of antimony in the SnO2 is demonstrated by FTIR. It is found that at low Sb concentrations, the Sb ions prefer to substitute Sn4+ in form of Sb5+. While beyond a certain Sb concentration, Sb ions start to be reduced to Sb3+, which have a negative effect on carrier concentration that, in turn, affects the reflectivity of SnO2:Sb films. The increased disorder of SnO2 at high Sb concentration is also shown by FTIR. The discussion of carrier scattering suggests that the ionized impurity and/or neutral impurity scattering are the dominant scattering mechanisms.",

keywords = "Defects, FTIR, Reflectivity, Structural, Thin films",

author = "B. Zhang and Y. Tian and Zhang, \{J. X.\} and W. Cai",

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doi = "10.1016/j.matlet.2011.01.052",

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T1 - The FTIR studies of SnO2:Sb(ATO) films deposited by spray pyrolysis

AU - Zhang, B.

AU - Tian, Y.

AU - Zhang, J. X.

AU - Cai, W.

PY - 2011/4/30

Y1 - 2011/4/30

N2 - Thin films of SnO2:Sb were prepared by ultrasonic spray pyrolysis method. The role of antimony in the SnO2 is demonstrated by FTIR. It is found that at low Sb concentrations, the Sb ions prefer to substitute Sn4+ in form of Sb5+. While beyond a certain Sb concentration, Sb ions start to be reduced to Sb3+, which have a negative effect on carrier concentration that, in turn, affects the reflectivity of SnO2:Sb films. The increased disorder of SnO2 at high Sb concentration is also shown by FTIR. The discussion of carrier scattering suggests that the ionized impurity and/or neutral impurity scattering are the dominant scattering mechanisms.

AB - Thin films of SnO2:Sb were prepared by ultrasonic spray pyrolysis method. The role of antimony in the SnO2 is demonstrated by FTIR. It is found that at low Sb concentrations, the Sb ions prefer to substitute Sn4+ in form of Sb5+. While beyond a certain Sb concentration, Sb ions start to be reduced to Sb3+, which have a negative effect on carrier concentration that, in turn, affects the reflectivity of SnO2:Sb films. The increased disorder of SnO2 at high Sb concentration is also shown by FTIR. The discussion of carrier scattering suggests that the ionized impurity and/or neutral impurity scattering are the dominant scattering mechanisms.

KW - Defects

KW - FTIR

KW - Reflectivity

KW - Structural

KW - Thin films

UR - https://www.scopus.com/pages/publications/79952448992

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DO - 10.1016/j.matlet.2011.01.052

M3 - 文章

AN - SCOPUS:79952448992

SN - 0167-577X

VL - 65

SP - 1204

EP - 1206

JO - Materials Letters

JF - Materials Letters

IS - 8

ER -

The FTIR studies of SnO₂:Sb(ATO) films deposited by spray pyrolysis

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Keywords

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