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The analysis of coupled interconnect with process parameter variation based wavelet collocation method

  • School of Astronautics, Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

In this paper, a novel approach based on fast wavelet collocation method (FWCM) is presented to solve partial differential equations (PDEs) in coupled on-chip interconnects with parameter variations. After processing PDEs by decomposing variables with wavelet functions, we transfer the PDEs into ordinary differential equations (ODEs), and then use Taylor expansion in the ODEs to approximate the partial complex expression containing inverse matrix. Consequently, we can solve the PDEs with random variables more feasibly. Moreover, this approach provides a new idea for solving other kinds of PDEs with random variables in very large scaled integrated circuits (VLSI). Comparison with HSPICE simulation results shows the method proposed in this paper is effective and accurate.

Original languageEnglish
Pages (from-to)773-778
Number of pages6
JournalAEU - International Journal of Electronics and Communications
Volume68
Issue number8
DOIs
StatePublished - Aug 2014
Externally publishedYes

Keywords

  • Integrated circuit
  • Interconnect wire
  • Partial differential equation
  • Process parameter variation
  • Wavelet transform

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