Surface properties of AZ31B magnesium alloy by Oxygen plasma immersion ion implantation

Wei Chunbei; Gong Chunzhi; Tian Xiubo; Yang Shiqin; Ricky K.Y. Fu; Paul K. Chu

doi:10.1088/1009-0630/11/1/07

Surface properties of AZ31B magnesium alloy by Oxygen plasma immersion ion implantation

Wei Chunbei
, Gong Chunzhi
, Tian Xiubo^*
, Yang Shiqin
, Ricky K.Y. Fu
, Paul K. Chu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Oxygen plasma immersion ion implantation (PIII) has been conducted on AZ31B magnesium alloy using different bias voltages. The modified layer is mainly composed of MgO and some MgAl₂O₄. Results form Rutherford backscattering spectrometry (RBS) and X-ray photoelectron spectroscopy (XPS) indicate that the bias voltage has a significant impact on the structure of the films. The oxygen implant fluences and the thickness of the implanted layer increase with higher bias voltages. A high bias voltage such as 60 kV leads to an unexpected increments in the oxygen-rich layer's thickness compared to those of the samples implanted at 20 kV and 40 kV. The hardness is hardly enhanced by oxygen PIII. The corrosion resistance of magnesium alloy may be improved by a proper implantation voltage.

Original language	English
Pages (from-to)	33-37
Number of pages	5
Journal	Plasma Science and Technology
Volume	11
Issue number	1
DOIs	https://doi.org/10.1088/1009-0630/11/1/07
State	Published - 2009
Externally published	Yes

Keywords

Corrosion resistance
Hardness
Magnesium alloy
Oxygen plasma implantation
Structure

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10.1088/1009-0630/11/1/07

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title = "Surface properties of AZ31B magnesium alloy by Oxygen plasma immersion ion implantation",

abstract = "Oxygen plasma immersion ion implantation (PIII) has been conducted on AZ31B magnesium alloy using different bias voltages. The modified layer is mainly composed of MgO and some MgAl2O4. Results form Rutherford backscattering spectrometry (RBS) and X-ray photoelectron spectroscopy (XPS) indicate that the bias voltage has a significant impact on the structure of the films. The oxygen implant fluences and the thickness of the implanted layer increase with higher bias voltages. A high bias voltage such as 60 kV leads to an unexpected increments in the oxygen-rich layer's thickness compared to those of the samples implanted at 20 kV and 40 kV. The hardness is hardly enhanced by oxygen PIII. The corrosion resistance of magnesium alloy may be improved by a proper implantation voltage.",

keywords = "Corrosion resistance, Hardness, Magnesium alloy, Oxygen plasma implantation, Structure",

author = "Wei Chunbei and Gong Chunzhi and Tian Xiubo and Yang Shiqin and Fu, \{Ricky K.Y.\} and Chu, \{Paul K.\}",

year = "2009",

doi = "10.1088/1009-0630/11/1/07",

language = "英语",

volume = "11",

pages = "33--37",

journal = "Plasma Science and Technology",

issn = "1009-0630",

publisher = "IOP Publishing Ltd.",

number = "1",

}

TY - JOUR

T1 - Surface properties of AZ31B magnesium alloy by Oxygen plasma immersion ion implantation

AU - Chunbei, Wei

AU - Chunzhi, Gong

AU - Xiubo, Tian

AU - Shiqin, Yang

AU - Fu, Ricky K.Y.

AU - Chu, Paul K.

PY - 2009

Y1 - 2009

N2 - Oxygen plasma immersion ion implantation (PIII) has been conducted on AZ31B magnesium alloy using different bias voltages. The modified layer is mainly composed of MgO and some MgAl2O4. Results form Rutherford backscattering spectrometry (RBS) and X-ray photoelectron spectroscopy (XPS) indicate that the bias voltage has a significant impact on the structure of the films. The oxygen implant fluences and the thickness of the implanted layer increase with higher bias voltages. A high bias voltage such as 60 kV leads to an unexpected increments in the oxygen-rich layer's thickness compared to those of the samples implanted at 20 kV and 40 kV. The hardness is hardly enhanced by oxygen PIII. The corrosion resistance of magnesium alloy may be improved by a proper implantation voltage.

AB - Oxygen plasma immersion ion implantation (PIII) has been conducted on AZ31B magnesium alloy using different bias voltages. The modified layer is mainly composed of MgO and some MgAl2O4. Results form Rutherford backscattering spectrometry (RBS) and X-ray photoelectron spectroscopy (XPS) indicate that the bias voltage has a significant impact on the structure of the films. The oxygen implant fluences and the thickness of the implanted layer increase with higher bias voltages. A high bias voltage such as 60 kV leads to an unexpected increments in the oxygen-rich layer's thickness compared to those of the samples implanted at 20 kV and 40 kV. The hardness is hardly enhanced by oxygen PIII. The corrosion resistance of magnesium alloy may be improved by a proper implantation voltage.

KW - Corrosion resistance

KW - Hardness

KW - Magnesium alloy

KW - Oxygen plasma implantation

KW - Structure

UR - https://www.scopus.com/pages/publications/65349129981

U2 - 10.1088/1009-0630/11/1/07

DO - 10.1088/1009-0630/11/1/07

M3 - 文章

AN - SCOPUS:65349129981

SN - 1009-0630

VL - 11

SP - 33

EP - 37

JO - Plasma Science and Technology

JF - Plasma Science and Technology

IS - 1

ER -

Surface properties of AZ31B magnesium alloy by Oxygen plasma immersion ion implantation

Abstract

Keywords

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