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Surface modification of TiNi alloy through tantalum immersion ion implantation

  • Y. Cheng*
  • , C. Wei
  • , K. Y. Gan
  • , L. C. Zhao
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

TiNi alloy samples were implanted with tantalum at a dose of 3.1 × 1017 N/cm2 by means of Plasma immersion ion implantation (PIII) method. The surface morphology, chemical composition was characterized by Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The corrosion resistance, were determined by electrochemical methods in 0.9% NaCl solution at 37 °C. The results show that PIII treatment can increase the open-circuit corrosion potential (Ecorr) and decrease the corrosion current density (Icorr). The pitting potential (Ebr) for the tantalum implanted TiNi alloy is approximately 810 mV, more than 200 mV higher than that of the unimplanted one. The corrosion hystersis loop of the unimplanted TiNi alloy is larger than that of the implanted material, indicating improvement of the repassivating ability and pitting resistance of the TiNi alloys.

Original languageEnglish
Pages (from-to)261-265
Number of pages5
JournalSurface and Coatings Technology
Volume176
Issue number2
DOIs
StatePublished - Jan 2004
Externally publishedYes

Keywords

  • Corrosion resistance
  • Plasma immersion ion implantation
  • Tantalum
  • TiNi alloy

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