Surface characteristics of Ni-Ga-Fe sputtered thin films

W. Cai; H. B. Wang; X. An; L. X. Gao; Z. Y. Gao; L. C. Zhao

doi:10.1016/j.msea.2006.02.091

Surface characteristics of Ni-Ga-Fe sputtered thin films

W. Cai^*
, H. B. Wang
, X. An
, L. X. Gao
, Z. Y. Gao
, L. C. Zhao

^*Corresponding author for this work

Harbin Institute of Technology
Heilongjiang University

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Chemical composition and surface morphology of Ni-Ga-Fe thin films grown under various sputtering powers and argon gas pressures by r.f. magnetron sputtering technique are studied. X-ray fluorescence results show that the sputtering power has obvious effect on the chemical composition of Ni-Ga-Fe thin films. The argon gas pressure has little effect on the composition of Ni-Ga-Fe thin films. The change in surface morphology of Ni-Ga-Fe films is discussed in terms of root-mean-square (rms) surface roughness values. The grain size and the rms of Ni-Ga-Fe thin films increase with the increase of sputtering power and argon gas pressure. The film deposited at room temperature has a cubic L2₁ structure and the annealed film shows martensitic structure.

Original language	English
Pages (from-to)	994-998
Number of pages	5
Journal	Materials Science and Engineering: A
Volume	438-440
Issue number	SPEC. ISS.
DOIs	https://doi.org/10.1016/j.msea.2006.02.091
State	Published - 25 Nov 2006
Externally published	Yes

Keywords

Magnetron sputtering
Ni-Ga-Fe thin film
Structure
Surface morphology

Access to Document

10.1016/j.msea.2006.02.091

Cite this

@article{22ad2f4a65b1433eae7a98ae23d656c9,

title = "Surface characteristics of Ni-Ga-Fe sputtered thin films",

abstract = "Chemical composition and surface morphology of Ni-Ga-Fe thin films grown under various sputtering powers and argon gas pressures by r.f. magnetron sputtering technique are studied. X-ray fluorescence results show that the sputtering power has obvious effect on the chemical composition of Ni-Ga-Fe thin films. The argon gas pressure has little effect on the composition of Ni-Ga-Fe thin films. The change in surface morphology of Ni-Ga-Fe films is discussed in terms of root-mean-square (rms) surface roughness values. The grain size and the rms of Ni-Ga-Fe thin films increase with the increase of sputtering power and argon gas pressure. The film deposited at room temperature has a cubic L21 structure and the annealed film shows martensitic structure.",

keywords = "Magnetron sputtering, Ni-Ga-Fe thin film, Structure, Surface morphology",

author = "W. Cai and Wang, \{H. B.\} and X. An and Gao, \{L. X.\} and Gao, \{Z. Y.\} and Zhao, \{L. C.\}",

year = "2006",

month = nov,

day = "25",

doi = "10.1016/j.msea.2006.02.091",

language = "英语",

volume = "438-440",

pages = "994--998",

journal = "Materials Science and Engineering: A",

issn = "0921-5093",

publisher = "Elsevier Ltd",

number = "SPEC. ISS.",

}

TY - JOUR

T1 - Surface characteristics of Ni-Ga-Fe sputtered thin films

AU - Cai, W.

AU - Wang, H. B.

AU - An, X.

AU - Gao, L. X.

AU - Gao, Z. Y.

AU - Zhao, L. C.

PY - 2006/11/25

Y1 - 2006/11/25

N2 - Chemical composition and surface morphology of Ni-Ga-Fe thin films grown under various sputtering powers and argon gas pressures by r.f. magnetron sputtering technique are studied. X-ray fluorescence results show that the sputtering power has obvious effect on the chemical composition of Ni-Ga-Fe thin films. The argon gas pressure has little effect on the composition of Ni-Ga-Fe thin films. The change in surface morphology of Ni-Ga-Fe films is discussed in terms of root-mean-square (rms) surface roughness values. The grain size and the rms of Ni-Ga-Fe thin films increase with the increase of sputtering power and argon gas pressure. The film deposited at room temperature has a cubic L21 structure and the annealed film shows martensitic structure.

AB - Chemical composition and surface morphology of Ni-Ga-Fe thin films grown under various sputtering powers and argon gas pressures by r.f. magnetron sputtering technique are studied. X-ray fluorescence results show that the sputtering power has obvious effect on the chemical composition of Ni-Ga-Fe thin films. The argon gas pressure has little effect on the composition of Ni-Ga-Fe thin films. The change in surface morphology of Ni-Ga-Fe films is discussed in terms of root-mean-square (rms) surface roughness values. The grain size and the rms of Ni-Ga-Fe thin films increase with the increase of sputtering power and argon gas pressure. The film deposited at room temperature has a cubic L21 structure and the annealed film shows martensitic structure.

KW - Magnetron sputtering

KW - Ni-Ga-Fe thin film

KW - Structure

KW - Surface morphology

UR - https://www.scopus.com/pages/publications/33750491651

U2 - 10.1016/j.msea.2006.02.091

DO - 10.1016/j.msea.2006.02.091

M3 - 文章

AN - SCOPUS:33750491651

SN - 0921-5093

VL - 438-440

SP - 994

EP - 998

JO - Materials Science and Engineering: A

JF - Materials Science and Engineering: A

IS - SPEC. ISS.

ER -

Surface characteristics of Ni-Ga-Fe sputtered thin films

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this