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Study on oxidation property of TiAl/NiCoCrAl microlaminated sheet prepared by EB-PVD

  • Guiqing Chen*
  • , Rubing Zhang
  • , Deming Zhang
  • , Hao Zou
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • Beijing General Research Institute of Mining and Metallurgy

Research output: Contribution to journalArticlepeer-review

Abstract

TiAl/NiCoCrAl microlaminated sheet prepared by EB-PVD have been oxygenized in air at 850°C, and its oxidation property has been studied. The phase composition and microstructure have been analyzed by XRD and SEM. The results show TiAl/NiCoCrAl microlaminated sheet has good oxidation resistance and the oxidation kinetics curves follow the parabolic law. The oxidation mechanisms of TiAl/NiCoCrAl microlaminated sheet at high temperature is that Al on the surface will generate the Al 2O 3 monolayer oxide film with porous structure firstly, subsequently some Ti element in the inner TiAl layers will cross over the NiCoCrAl layers and reach the surface to generate the (TiO 2 + Al 2O 3) oxide layer, and finally Ni and Cr in the NiCoCrAl layers can generate compact outer oxide film composed of Cr 2O 3 and NiCr 2O 4 phase, which is the essential reason why the oxidation resistance of the sheet increases obviously.

Original languageEnglish
Pages (from-to)120-123
Number of pages4
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume41
Issue number1
StatePublished - Jan 2012

Keywords

  • EB-PVD
  • Microlaminated sheet
  • Oxidation property
  • TiAl/NiCoCrAl

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