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Study on effects of the feed on AFM-based nano-scratching process using MD simulation

  • Yongda Yan*
  • , Tao Sun
  • , Shen Dong
  • , Yingchun Liang
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

AFM is a powerful and versatile tool which has the ability to fabricate nanoelectronics and other nanoparts using nano-scratching method. To achieve a deeper understanding on AFM-based nano-scratching process, molecular dynamic (MD) simulation approach is employed. Interactive forces between a rigid pyramidal tool simulating an AFM diamond tip and a copper sample are modeled by the Morse function. Two adjacent scratching tests are carried out at different feeds simulating the multiple scratching tests. Effects of the feed on the scratching process are discussed. Results show that the feed has a significant effect on the deformation of the machined surface, the scratching depth, scratching forces and potential energy. The important effect of the relax process in the MD simulation of AFM-based multiple nano-scratching processes is exhibited, which cannot be ignored when analyzing the variation of the potential energy.

Original languageEnglish
Pages (from-to)1-5
Number of pages5
JournalComputational Materials Science
Volume40
Issue number1
DOIs
StatePublished - Jul 2007

Keywords

  • Atomic force microscopy
  • Copper
  • Diamond
  • Molecular dynamics
  • Nanopatterning

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