Structural effect on electronic sputtering of hydrogenated amorphous carbon films

S. Ghosh; Alka Ingale; T. Som; D. Kabiraj; A. Tripathi; S. Mishra; S. Zhang; X. Hong; D. K. Avasthi

doi:10.1016/S0038-1098(01)00426-4

Structural effect on electronic sputtering of hydrogenated amorphous carbon films

S. Ghosh
, Alka Ingale
, T. Som
, D. Kabiraj
, A. Tripathi
, S. Mishra
, S. Zhang
, X. Hong
, D. K. Avasthi^*

^*Corresponding author for this work

Inter University Accelerator Centre India
Centre for Advanced Technology
Agency for Science, Technology and Research, Singapore

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

A large erosion (∼10⁵ atoms/ion) of C and H from hydrogenated amorphous carbon films (a-C:H) is observed due to the bombardment of 150 MeV Ag¹³⁺ ions. The erosion rate is monitored on-line by elastic recoil detection analysis (ERDA) technique. From the set of four samples under study, two films show erosion of both C and H, whereas, only H depletion takes place from the other two films. The observed variation in sputtering yield in different films is explained on the basis of structure and chemical environment of the films. It is shown in the framework of thermal spike model that the thermal energy confinement due to smaller cluster or domain sizes of the film influences the erosion. Structure of the films is revealed by Raman spectroscopy and is discussed on the basis of their Raman G and D modes.

Original language	English
Pages (from-to)	445-450
Number of pages	6
Journal	Solid State Communications
Volume	120
Issue number	11
DOIs	https://doi.org/10.1016/S0038-1098(01)00426-4
State	Published - 19 Nov 2001
Externally published	Yes

Keywords

D. Electronic sputtering
D. Elsastic recoil detection analysis
D. Hydrogenated amorphous carbon
D. Raman spectroscopy
D. Swift heavy ion
D. Thermal spike

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10.1016/S0038-1098(01)00426-4

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title = "Structural effect on electronic sputtering of hydrogenated amorphous carbon films",

abstract = "A large erosion (∼105 atoms/ion) of C and H from hydrogenated amorphous carbon films (a-C:H) is observed due to the bombardment of 150 MeV Ag13+ ions. The erosion rate is monitored on-line by elastic recoil detection analysis (ERDA) technique. From the set of four samples under study, two films show erosion of both C and H, whereas, only H depletion takes place from the other two films. The observed variation in sputtering yield in different films is explained on the basis of structure and chemical environment of the films. It is shown in the framework of thermal spike model that the thermal energy confinement due to smaller cluster or domain sizes of the film influences the erosion. Structure of the films is revealed by Raman spectroscopy and is discussed on the basis of their Raman G and D modes.",

keywords = "D. Electronic sputtering, D. Elsastic recoil detection analysis, D. Hydrogenated amorphous carbon, D. Raman spectroscopy, D. Swift heavy ion, D. Thermal spike",

author = "S. Ghosh and Alka Ingale and T. Som and D. Kabiraj and A. Tripathi and S. Mishra and S. Zhang and X. Hong and Avasthi, \{D. K.\}",

year = "2001",

month = nov,

day = "19",

doi = "10.1016/S0038-1098(01)00426-4",

language = "英语",

volume = "120",

pages = "445--450",

journal = "Solid State Communications",

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number = "11",

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TY - JOUR

T1 - Structural effect on electronic sputtering of hydrogenated amorphous carbon films

AU - Ghosh, S.

AU - Ingale, Alka

AU - Som, T.

AU - Kabiraj, D.

AU - Tripathi, A.

AU - Mishra, S.

AU - Zhang, S.

AU - Hong, X.

AU - Avasthi, D. K.

PY - 2001/11/19

Y1 - 2001/11/19

N2 - A large erosion (∼105 atoms/ion) of C and H from hydrogenated amorphous carbon films (a-C:H) is observed due to the bombardment of 150 MeV Ag13+ ions. The erosion rate is monitored on-line by elastic recoil detection analysis (ERDA) technique. From the set of four samples under study, two films show erosion of both C and H, whereas, only H depletion takes place from the other two films. The observed variation in sputtering yield in different films is explained on the basis of structure and chemical environment of the films. It is shown in the framework of thermal spike model that the thermal energy confinement due to smaller cluster or domain sizes of the film influences the erosion. Structure of the films is revealed by Raman spectroscopy and is discussed on the basis of their Raman G and D modes.

AB - A large erosion (∼105 atoms/ion) of C and H from hydrogenated amorphous carbon films (a-C:H) is observed due to the bombardment of 150 MeV Ag13+ ions. The erosion rate is monitored on-line by elastic recoil detection analysis (ERDA) technique. From the set of four samples under study, two films show erosion of both C and H, whereas, only H depletion takes place from the other two films. The observed variation in sputtering yield in different films is explained on the basis of structure and chemical environment of the films. It is shown in the framework of thermal spike model that the thermal energy confinement due to smaller cluster or domain sizes of the film influences the erosion. Structure of the films is revealed by Raman spectroscopy and is discussed on the basis of their Raman G and D modes.

KW - D. Electronic sputtering

KW - D. Elsastic recoil detection analysis

KW - D. Hydrogenated amorphous carbon

KW - D. Raman spectroscopy

KW - D. Swift heavy ion

KW - D. Thermal spike

UR - https://www.scopus.com/pages/publications/0035914571

U2 - 10.1016/S0038-1098(01)00426-4

DO - 10.1016/S0038-1098(01)00426-4

M3 - 文章

AN - SCOPUS:0035914571

SN - 0038-1098

VL - 120

SP - 445

EP - 450

JO - Solid State Communications

JF - Solid State Communications

IS - 11

ER -

Structural effect on electronic sputtering of hydrogenated amorphous carbon films

Abstract

Keywords

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