Stress, mechanical and adhesion properties of multilayer tetrahedral amorphous carbon films

Xiao Han; Jiaqi Zhu; Jiecai Han; Manlin Tan; Zecun Jia; Chunzhu Jiang

doi:10.1016/j.apsusc.2008.06.087

Stress, mechanical and adhesion properties of multilayer tetrahedral amorphous carbon films

Xiao Han
, Jiaqi Zhu^*
, Jiecai Han
, Manlin Tan
, Zecun Jia
, Chunzhu Jiang

^*Corresponding author for this work

School of Astronautics

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

To reduce the stress of tetrahedral amorphous carbon (ta-C) films and improve the adhesion, a graded multilayer film was deposited using a filter cathodic vacuum arc (FCVA) deposition system. Nanoindentation measurement revealed the high hardness and Young's modulus of the multilayer films. Nanoscratch test was used to estimate the scratching resistance of the multilayer films on Si substrate. The high critical scratch load implied the good cohesive and adhesive strengths of the graded multilayer films.

Original language	English
Pages (from-to)	607-609
Number of pages	3
Journal	Applied Surface Science
Volume	255
Issue number	2
DOIs	https://doi.org/10.1016/j.apsusc.2008.06.087
State	Published - 15 Nov 2008

Keywords

Amorphous materials
Gradient coatings
Mechanical properties
Residual stresses
Thin films

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10.1016/j.apsusc.2008.06.087

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title = "Stress, mechanical and adhesion properties of multilayer tetrahedral amorphous carbon films",

abstract = "To reduce the stress of tetrahedral amorphous carbon (ta-C) films and improve the adhesion, a graded multilayer film was deposited using a filter cathodic vacuum arc (FCVA) deposition system. Nanoindentation measurement revealed the high hardness and Young's modulus of the multilayer films. Nanoscratch test was used to estimate the scratching resistance of the multilayer films on Si substrate. The high critical scratch load implied the good cohesive and adhesive strengths of the graded multilayer films.",

keywords = "Amorphous materials, Gradient coatings, Mechanical properties, Residual stresses, Thin films",

author = "Xiao Han and Jiaqi Zhu and Jiecai Han and Manlin Tan and Zecun Jia and Chunzhu Jiang",

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T1 - Stress, mechanical and adhesion properties of multilayer tetrahedral amorphous carbon films

AU - Han, Xiao

AU - Zhu, Jiaqi

AU - Han, Jiecai

AU - Tan, Manlin

AU - Jia, Zecun

AU - Jiang, Chunzhu

PY - 2008/11/15

Y1 - 2008/11/15

N2 - To reduce the stress of tetrahedral amorphous carbon (ta-C) films and improve the adhesion, a graded multilayer film was deposited using a filter cathodic vacuum arc (FCVA) deposition system. Nanoindentation measurement revealed the high hardness and Young's modulus of the multilayer films. Nanoscratch test was used to estimate the scratching resistance of the multilayer films on Si substrate. The high critical scratch load implied the good cohesive and adhesive strengths of the graded multilayer films.

AB - To reduce the stress of tetrahedral amorphous carbon (ta-C) films and improve the adhesion, a graded multilayer film was deposited using a filter cathodic vacuum arc (FCVA) deposition system. Nanoindentation measurement revealed the high hardness and Young's modulus of the multilayer films. Nanoscratch test was used to estimate the scratching resistance of the multilayer films on Si substrate. The high critical scratch load implied the good cohesive and adhesive strengths of the graded multilayer films.

KW - Amorphous materials

KW - Gradient coatings

KW - Mechanical properties

KW - Residual stresses

KW - Thin films

UR - https://www.scopus.com/pages/publications/54349098936

U2 - 10.1016/j.apsusc.2008.06.087

DO - 10.1016/j.apsusc.2008.06.087

M3 - 文章

AN - SCOPUS:54349098936

SN - 0169-4332

VL - 255

SP - 607

EP - 609

JO - Applied Surface Science

JF - Applied Surface Science

IS - 2

ER -

Stress, mechanical and adhesion properties of multilayer tetrahedral amorphous carbon films

Abstract

Keywords

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