Skip to main navigation Skip to search Skip to main content

Simulation study of dimensional effect on bipolar resistive random access memory (RRAM)

  • Kai Liu*
  • , Kailiang Zhang
  • , Fang Wang
  • , Jinshi Zhao
  • , Jun Wei
  • *Corresponding author for this work
  • Tianjin University of Technology
  • Tianjin University
  • Agency for Science, Technology and Research, Singapore

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The dependency of the RRAM device electrical parameters such as set voltage, reset current and resistance on the RRAM cell dimensional scalability is investigated with Monte Carlo simulation to optimize the power consumption of bipolar RRAM. It is found in the simulation that the switching process in bipolar RRAM is related to the cell dimension in the sub-nm region in terms of its horizontal length. The suppressing effect of existing conducting filament is also discussed. With optimal cell size sufficient initial resistance and a low forming voltage will be achieved, accelerating the feasibility of the high-density low-power RRAM.

Original languageEnglish
Title of host publicationProceedings of the 2013 IEEE 5th International Nanoelectronics Conference, INEC 2013
Pages306-308
Number of pages3
DOIs
StatePublished - 2013
Externally publishedYes
Event2013 IEEE 5th International Nanoelectronics Conference, INEC 2013 - Singapore, Singapore
Duration: 2 Jan 20134 Jan 2013

Publication series

NameProceedings - Winter Simulation Conference
ISSN (Print)0891-7736

Conference

Conference2013 IEEE 5th International Nanoelectronics Conference, INEC 2013
Country/TerritorySingapore
CitySingapore
Period2/01/134/01/13

Keywords

  • RRAM
  • electric parameter and computational simulation
  • power consumption

Fingerprint

Dive into the research topics of 'Simulation study of dimensional effect on bipolar resistive random access memory (RRAM)'. Together they form a unique fingerprint.

Cite this