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Simulation of surface modification of long shaft by DC ion implantation

  • Mingzhe Cai
  • , Chunyu Zhang
  • , Chunzhi Gong*
  • , Xiubo Tian
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Surface modification of a long shaft by DC ion implantation was mathematically modeled on the basis of particle-in-cell scheme, and numerically simulated with software package Matlab. The influence of the ion implantation conditions, especially the shaft-grid distance, shaft's radius and bias voltage, and ion species, on the implanted area and implantation angle was evaluated. The results show that the shaft-grid distance and shaft's radius have a major impact on the implantation dynamics. For instance, as the distance increases, both the implanted area and implantation angle decrease; and a reduced shaft radius results in an increase of implantation area and a stronger fluctuation of implantation angle. Besides, the shaft's bias voltage and ion species weakly affect the ion trajectory, implantation angle and positions.

Original languageEnglish
Pages (from-to)443-448
Number of pages6
JournalZhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology
Volume34
Issue number5
DOIs
StatePublished - May 2014

Keywords

  • Direct current plasma implantation
  • Ion trajectory
  • Long shaft
  • MATLAB software
  • Particle-in-cell

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