Simulation of Plasma-Chemical Processes in Ar/CF₄ Mixture in a Short Low-Pressure Glow Discharge

Abstract: The paper presents the results of numerical simulations on the study of plasma-chemical processes in the Ar/CF₄ mixture in a short low-pressure glow discharge. It is shown that in the case of a 10% CF₄ impurity content, the discharge reaches stationary distributions of plasma parameters. In this case, the cathode and anode layers of the space charge, a narrow layer near the electron-ion plasma near the cathode layer and ion-ion plasma are formed. In the case of a small impurity of 1% CF₄ impurity, the discharge remains non-stationary over the entire considered time range. For the considered ranges of external parameters, the main products of CF₄ conversion are atomic F and molecular fluorine F₂, as well as CF₃.