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Simulation and parameters optimization of high gain silicon micro-pixel avalanche photodiode

  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper, the silicon avalanche photodiode (Si-APD) size in micron, which was comprised of separate layer of absorption charge and multiplication (SACM) has been studied. The influence of different thicknesses and different doping concentration of the absorption, charge and multiplication layer on the electric field distribution, current-voltage characteristic and breakdown voltage were simulated and analyzed respectively. The structural parameters optimization has be done with the simulation results. The results show that the better gain and low bias voltage can be achieved with layer thicknesses in micro/nano-sized, which can give a high gain of 106 and low bias voltage of 127V. Also the fabrication process conditions has been given.

Original languageEnglish
Title of host publicationOptoelectronic Devices and Integration IV
DOIs
StatePublished - 2012
EventOptoelectronic Devices and Integration IV - Beijing, China
Duration: 5 Nov 20127 Nov 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8555
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptoelectronic Devices and Integration IV
Country/TerritoryChina
CityBeijing
Period5/11/127/11/12

Keywords

  • Avalanche gain
  • Avalanche photodiode
  • SACM
  • Si-APD

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