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Scanning probe microscopy induced surface modifications of the topological insulator Bi2Te3 in different environments

  • Asteriona Maria Netsou*
  • , Umamahesh Thupakula
  • , Jolien Debehets
  • , Taishi Chen
  • , Brandon Hirsch
  • , Alexander Volodin
  • , Zhe Li
  • , Fengqi Song
  • , Jin Won Seo
  • , Steven De Feyter
  • , Koen Schouteden
  • , Chris Van Haesendonck
  • *Corresponding author for this work
  • KU Leuven
  • Max Planck Institute for Chemical Physics of Solids
  • Nanjing University

Research output: Contribution to journalArticlepeer-review

Abstract

We investigated the topological insulator (TI) Bi2Te3 in four different environments (ambient, ultra-high vacuum (UHV), nitrogen gas and organic solvent environment) using scanning probe microscopy (SPM) techniques. Upon prolonged exposure to ambient conditions and organic solvent environments the cleaved surface of the pristine Bi2Te3 is observed to be strongly modified during SPM measurements, while imaging of freshly cleaved Bi2Te3 in UHV and nitrogen gas shows considerably less changes of the Bi2Te3 surface. We conclude that the reduced surface stability upon exposure to ambient conditions is triggered by adsorption of molecular species from ambient, including H2O, CO2, etc which is verified by Auger electron spectroscopy. Our findings of the drastic impact of exposure to ambient on the Bi2Te3 surface are crucial for further in-depth studies of the intrinsic properties of the TI Bi2Te3 and for potential applications that include room temperature TI based devices operated under ambient conditions.

Original languageEnglish
Article number335706
JournalNanotechnology
Volume28
Issue number33
DOIs
StatePublished - 21 Jul 2017
Externally publishedYes

Keywords

  • ambient conditions
  • bismuth telluride
  • scanning probe microscopy
  • surface modification
  • topological insulator

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