Room-temperature photoluminescence of doped 4H-SiC film grown on AlN/Si(100)

Well-defined room-temperature photoluminescence (PL) was observed from 4H-SiC films on AlN/Si(100) complex substrates grown at temperatures below 1150 °C by the chemical vapor deposition method. The PL spectrum consists of three major emission peaks in the vicinities of 3.03 3.17 and 3.37 eV. By the combination of experimental measurements and theoretical analysis the origins of the PL emission peaks have been identified and associated with N donors Al acceptors in the 4H-SiC films and the band-to-band transition between the second minimum of the conduction band and the top of valance band of the 4H-SiC. The room-temperature SiC PL can be much utilized for optoelectronic high-power high-frequency and high-temperature applications in the ultraviolet spectral regime.