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Revising model for the bias errors correcting during stitching measure aspheric surface

  • Yu Jing Qiao*
  • , Jiu Bin Tan
  • , Wei Bo Wang
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

In order to find a solution to fitting the overlap of two sub-apertures precisely. Derive the function relation between the bias errors and movement freedom for sub-aperture interferometry conicoid. The result of analysis shows, the action appearance of bias errors act in accord with Seidle aberration. And present correcting aberrations method for precise stitching interferometry conicoid. By means of founding a revising bias errors model of stitching measure, obtain the stitching coefficients with least square fitting method, and acquire the estimate values of bias errors. This method improve the sub-apertures overlap's fitting precision, because revise the high order aberration of system. The experiment result shows, the stitching precision of this stitching method is higher than traditional stitching method of correcting three adjust errors.

Original languageEnglish
Pages (from-to)1497-1501
Number of pages5
JournalGuangdianzi Jiguang/Journal of Optoelectronics Laser
Volume19
Issue number11
StatePublished - Nov 2008

Keywords

  • Aspheric surface
  • Bias errors
  • Revising model
  • Stitching measure

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