Abstract
A novel method by using 3D parameters is presented to measure line edge roughness(LER). Single-side surface profiles (sidewall) are acquired using atomic force microscope(AFM). The single-side surface is reconstructed according to AFM working mechanism and measurement characters, and the reference plane is defined by regression theory. In line with integrated circuit development, as well as practical requirements in the semiconductor and lithography industry, a group of 3D-LER parameters are proposed to describe single-side surface profile. LER parameters are calculated via one measured sample, and the measurement precision of the standard error, one of LER parameters, is also given out.
| Original language | English |
|---|---|
| Pages (from-to) | 1635-1640 |
| Number of pages | 6 |
| Journal | Guangdianzi Jiguang/Journal of Optoelectronics Laser |
| Volume | 20 |
| Issue number | 12 |
| State | Published - Dec 2009 |
Keywords
- 3-D parameters
- Atomic force microscope
- Line edge roughness
- Reconstruction of line edge surface
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