Skip to main navigation Skip to search Skip to main content

Radiation defects studies on silicon bipolar junction transistor irradiated by Br ions and electrons

  • Harbin Institute of Technology
  • Freiberg University of Mining and Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Bipolar junction transistors are sensitive to both ionization and displacement damage due to charged particles from space radiation. Passivating oxides and the SiO2/Si interface are more sensitive to ionization damage whereas displacement damage may strongly influence the bulk properties of a device. Fast electrons with energies below a few MeV introduces exclusively target ionization while heavy ions at moderate energies (lower than 2 MeV/amu) results in displacement damage due to individual Frenkel-pairs generation. Although both kinds of radiation are basically independent an effective correlation was seen in the electronic characteristics of transistors. We report on the effects on current gain and current-voltage characteristics of bipolar junction transistors due to successive irradiation with 20 MeV Br ions and 110 keV electrons.

Original languageEnglish
Pages (from-to)244-246
Number of pages3
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume365
DOIs
StatePublished - 15 Dec 2015

Keywords

  • Bipolar junction transistor
  • Displacement damage
  • Gummel plot
  • Ionization damage

Fingerprint

Dive into the research topics of 'Radiation defects studies on silicon bipolar junction transistor irradiated by Br ions and electrons'. Together they form a unique fingerprint.

Cite this