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Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media

  • Yuliang Liu*
  • , Shaomin Xiong
  • , Jia Lou
  • , David B. Bogy
  • , Guangyu Zhang
  • *Corresponding author for this work
  • School of Mechatronics Engineering, Harbin Institute of Technology
  • University of California at Berkeley
  • CAS - Changchun Institute of Optics Fine Mechanics and Physics

Research output: Contribution to journalArticlepeer-review

Abstract

A series of nanoscratch experiments is conducted using constant loading scratch profiles to apply mechanical contact stress on perpendicular magnetic recording (PMR) media to cause its magnetic signal strength decay, which is characterized by the magnetic force microscope. The dependence of the magnetic signal strength on the applied normal load is quantitatively investigated. The results indicate that an increase of the applied normal load leads to a decrease of the magnetic signal strength. In addition, in order to obtain a more complete understanding of the results, a 3D finite element model is created to calculate the stress under different normal loads. Finally, the quantitative relationship between residual shear stress and magnetic signal strength is identified.

Original languageEnglish
Article number17B725
JournalJournal of Applied Physics
Volume115
Issue number17
DOIs
StatePublished - 7 May 2014
Externally publishedYes

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