Profiled anode for high speed continuous plating on thin metal strip

In order to improve the speed and quality of high speed continuous plating on thin metal strip and reduce the energy cost, it is very important to control the current density of metal electrodeposition and the geometric of the anode. Because the metal strip is not an equipotential substance, the big transmitted current is used during plating at high speed, they induce the non-uniform distributing of current density of metal electrodepositing. Therefore, a mathematical model of constant current density plating as well as a formula for calculating the geometric of the profiled anode was eswtablished, this work provided a theoretical foundation of density control in metal strip continuous high speed electrodeposition.