Preparation of Ti/N and Ag/TiNx multilayers by plasma based ion implantation with multi-targets unbalanced magnetron sputtering

Xinxin Ma; Xiaodong Li; Yue Sun; Lifang Xia; Mingren Sun; Guang Li

doi:10.1016/S0167-577X(00)00021-5

Preparation of Ti/N and Ag/TiN_x multilayers by plasma based ion implantation with multi-targets unbalanced magnetron sputtering

Xinxin Ma
, Xiaodong Li
, Yue Sun
, Lifang Xia
, Mingren Sun
, Guang Li

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Ti/N and Ag/TiN_x multilayers were prepared by plasma based ion implantation (PBII) with multi-targets unbalanced magnetron sputtering and analyzed by Auger electron microscopy (AES) and X-ray photoelectron spectroscopy (XPS). Nitrogen plasma gas and Ti and Ag multi-targets were used in this study. It was found that both gases and metal elements could be implanted into the samples. Ti/N and Ag/TiN_x multilayers were successfully fabricated by multi-cycle PBII with nitrogen plasma gas and Ti and Ag unbalanced magnetron sputtering. The possibility of design and fabrication of multilayers by this technique is also discussed. This technique for the deposition of films may find more applications.

Original language	English
Pages (from-to)	170-174
Number of pages	5
Journal	Materials Letters
Volume	44
Issue number	3
DOIs	https://doi.org/10.1016/S0167-577X(00)00021-5
State	Published - Jun 2000
Externally published	Yes

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10.1016/S0167-577X(00)00021-5

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title = "Preparation of Ti/N and Ag/TiNx multilayers by plasma based ion implantation with multi-targets unbalanced magnetron sputtering",

abstract = "Ti/N and Ag/TiNx multilayers were prepared by plasma based ion implantation (PBII) with multi-targets unbalanced magnetron sputtering and analyzed by Auger electron microscopy (AES) and X-ray photoelectron spectroscopy (XPS). Nitrogen plasma gas and Ti and Ag multi-targets were used in this study. It was found that both gases and metal elements could be implanted into the samples. Ti/N and Ag/TiNx multilayers were successfully fabricated by multi-cycle PBII with nitrogen plasma gas and Ti and Ag unbalanced magnetron sputtering. The possibility of design and fabrication of multilayers by this technique is also discussed. This technique for the deposition of films may find more applications.",

author = "Xinxin Ma and Xiaodong Li and Yue Sun and Lifang Xia and Mingren Sun and Guang Li",

year = "2000",

month = jun,

doi = "10.1016/S0167-577X(00)00021-5",

language = "英语",

volume = "44",

pages = "170--174",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

number = "3",

}

TY - JOUR

T1 - Preparation of Ti/N and Ag/TiNx multilayers by plasma based ion implantation with multi-targets unbalanced magnetron sputtering

AU - Ma, Xinxin

AU - Li, Xiaodong

AU - Sun, Yue

AU - Xia, Lifang

AU - Sun, Mingren

AU - Li, Guang

PY - 2000/6

Y1 - 2000/6

N2 - Ti/N and Ag/TiNx multilayers were prepared by plasma based ion implantation (PBII) with multi-targets unbalanced magnetron sputtering and analyzed by Auger electron microscopy (AES) and X-ray photoelectron spectroscopy (XPS). Nitrogen plasma gas and Ti and Ag multi-targets were used in this study. It was found that both gases and metal elements could be implanted into the samples. Ti/N and Ag/TiNx multilayers were successfully fabricated by multi-cycle PBII with nitrogen plasma gas and Ti and Ag unbalanced magnetron sputtering. The possibility of design and fabrication of multilayers by this technique is also discussed. This technique for the deposition of films may find more applications.

AB - Ti/N and Ag/TiNx multilayers were prepared by plasma based ion implantation (PBII) with multi-targets unbalanced magnetron sputtering and analyzed by Auger electron microscopy (AES) and X-ray photoelectron spectroscopy (XPS). Nitrogen plasma gas and Ti and Ag multi-targets were used in this study. It was found that both gases and metal elements could be implanted into the samples. Ti/N and Ag/TiNx multilayers were successfully fabricated by multi-cycle PBII with nitrogen plasma gas and Ti and Ag unbalanced magnetron sputtering. The possibility of design and fabrication of multilayers by this technique is also discussed. This technique for the deposition of films may find more applications.

UR - https://www.scopus.com/pages/publications/0033686378

U2 - 10.1016/S0167-577X(00)00021-5

DO - 10.1016/S0167-577X(00)00021-5

M3 - 文章

AN - SCOPUS:0033686378

SN - 0167-577X

VL - 44

SP - 170

EP - 174

JO - Materials Letters

JF - Materials Letters

IS - 3

ER -

Preparation of Ti/N and Ag/TiN_x multilayers by plasma based ion implantation with multi-targets unbalanced magnetron sputtering

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