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Preparation of silicon coating on SiC mirror by EB-PVD

  • Yumin Zhang*
  • , Yufeng Zhou
  • , Jiecai Han
  • , Jianhan Zhang
  • , Wang Yao
  • , Yuanyuan Han
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Some investigations into preparation of silicon coating on SiC mirror by Electronic Beam Physical Vapor Deposition (EB-PVD) are introduced in the paper, which include adhesion strength of coating to substrate, pattern of coating, and residual stress etc. According to the investigations, it was found that only when the temperature of substrate in the optimization temperature range, the excellent thermal-shock resistance and adhesion strength of coating to substrate are obtained. Furthermore, the coating has the column crystal structure, surface finish, deposition rate and gravity direction may have important influences on properties of coating-substrate system.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
DOIs
StatePublished - 2006
Event2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies - Advanced Optical Manufacturing and Testing Technologies - Xian, China
Duration: 2 Nov 20055 Nov 2005

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6149
ISSN (Print)0277-786X

Conference

Conference2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies - Advanced Optical Manufacturing and Testing Technologies
Country/TerritoryChina
CityXian
Period2/11/055/11/05

Keywords

  • Adhesion strength
  • Coating
  • Coating-substrate system
  • Column crystal
  • EB-PVD
  • Finish
  • Mirror
  • Porosity
  • Silicon
  • Substrate

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