Preparation and Surface Properties of Cr Coatings in High-power Pulsed Magnetron Sputtering Tubes with External Auxiliary Anode

The working environment of the inner surfaces of tubes in industrial production is harsh, necessitating higher performance against corrosion, friction, and wear. To improve the properties of the inner surfaces of tube and barrel parts, a high-power impulse magnetron sputtering (HiPIMS) coating method with an auxiliary anode is proposed. The auxiliary anode was first placed near the tube tail to attract plasma into the inner part of the tube. Chromium (Cr) coating was then deposited on the inner wall of a carbon steel tube with a diameter of 40 mm and a length of 120 mm. The effects of the auxiliary anode voltage on the discharge characteristics of the Cr target as well as the structure and mechanical properties of the Cr coating deposited on the tube’s inner surface were explored. The accessible depth of Cr deposition inside the tube was established. The plasma distribution inside the tube following the addition of the auxiliary anode was analyzed and a theoretical model was developed. The experiments demonstrated that the substrate current increases with higher auxiliary anode voltages, particularly at the tube tail position. When the auxiliary anode is positioned at the end of the tube, it attracts electrons deeper into the tube, resulting in increased ionization of additional ions and electrons during their movement. The ions generated by ionization are attracted to the inner wall of the tube by the negative charge carried by the tube. This can be inferred by comparing the emission spectral intensity curve between the nozzle and the tube tail. At the port position, when the auxiliary anode voltage is 20 V, the Ar+ feature peak value is the lowest, whereas the corresponding Cr* feature peak value is the highest. We infer that at 20 V, most of the energy is absorbed by the excited particles. However, under the influence of the auxiliary anode, electron escape is accelerated, inhibiting the discharge. The Cr film deposited at the tube port has a columnar structure, as shown by the cross-section morphology of the film deposited at different auxiliary anode voltages. At higher auxiliary anode voltages, the columnar crystal width decreases, and the deposited film becomes denser. As the auxiliary cathode voltage increases, the overall depth of the deposited chromium layer in the tube also increases. However, the deposition rate decreases with an increase in auxiliary anode voltage. This may be due to the higher energy of the particles that derives from the increased auxiliary anode voltage, which leads to the film densification and enhanced etching effects, thereby decreasing the deposition rate. The coating hardness and elastic modulus of the Cr film both increased initially and then decreased with increasing auxiliary anode voltage. At an auxiliary anode voltage of 40 V, the Cr coating achieved the best depth with the highest hardness and elastic modulus. Under HiPIMS discharge conditions, the effects of the auxiliary anode on the plasma can generally be summarized. First, by attracting electrons, the auxiliary anode regulates the direction of plasma’s movement. The plasma concentration can be greatly increased by the additional anode. An additional anode at the tube's end modifies the distribution of electric field lines in the vacuum chamber, reducing the number of escaping electrons. Second, high-density, high-energy plasma preferentially forms along the tube axis towards the auxiliary anode at the tube’s end, promoting further collision ionization of neutral particles inside the tube and delaying the decrease in plasma density caused by the increased distance from the target surface. The Cr coating deposited on the inner surface of the tube can be widely used in harsh environments.