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Prediction of a new leveler (N-butyl-methyl piperidinium bromide) for through-hole electroplating using molecular dynamics simulations

  • School of Chemistry and Chemical Engineering, Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Adsorption behaviors of N-butyl-methyl piperidinium bromide (PP 14Br) at Cu (001) surface under different electric fields were investigated using molecular dynamics (MD) simulations. We predicted PP 14Br could be used as a new leveler for through-hole copper electroplating. In the through-hole electroplating experiments, PP 14Br was employed as a leveler. The results of electroplating confirmed the prediction. The electrochemical tests were characterized by potentiodynamic polarization and galvanostatic measurements using rotating disk electrode operated at 100 and 1000 rpm.

Original languageEnglish
Pages (from-to)104-107
Number of pages4
JournalElectrochemistry Communications
Volume18
Issue number1
DOIs
StatePublished - 2012
Externally publishedYes

Keywords

  • Electroplating
  • Leveler
  • Molecular dynamics simulations
  • N-butyl-methyl piperidinium bromide
  • Through-hole

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