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Position control method based on photoelectric technology under strong magnetic interference environment

  • Guang Hui Bai*
  • , Song He Meng
  • , Yue Guo
  • , Mo Zhang
  • , Li Jun Jing
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • Center of Daqing Oil Field Technology Chemistry and Mechanical Academy

Research output: Contribution to journalArticlepeer-review

Abstract

Based on photoelectric technology, a new method is proposed for high precision position compensation control under strong magnetic interference. Relevant devices are developed, which testifies that the steady operating error is within 0.15 mm under the strong magnetic interference environment over 50000 mT. The results can be extended to other fields concerning position control.

Original languageEnglish
Pages (from-to)487-488+491
JournalYadian Yu Shengguang/Piezoelectrics and Acoustooptics
Volume30
Issue number4
StatePublished - Aug 2008

Keywords

  • Photoelectric technology
  • Position control
  • Strong magnetic interference

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