Plasma ion implantation to thin polymer foils

Plasma ion implantation and deposition of polymeric materials has gained substantial interest in recent years. This paper will present numerical results on initial potential on top surface and some examples on ion implantation of thin polymer foils. The results demonstrate that the thickness and permittivity of treated samples have a critical influence on initial potential drop across the insulating objects. The smaller thickness and larger permittivity are beneficial for ion implantation. Duplex films of Al₂O ₃/SiO₂ have been fabricated using are plasma ion implantation and deposition. The films may substantially increase atomic-oxygen resistance of Kapton foils, which have been frequently utilized in satellites in low-earth-orbit (LEO) environment. The mass loss of treated samples may decrease by one quarter of magnitude compared to that of control sample. The PET foils have also been implanted using C₂H₂ plasma ion implantation. The experimental results show that ion implantation may effectively enhance the gas barrier capability.