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Plasma immersion ion implantation into insulating materials

  • Xiubo Tian*
  • , Shiqin Yang
  • , Ricky K.Y. Fu
  • , Paul K. Chu
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Plasma immersion ion implantation (PHI) is an effective surface modification tool. During PHI processes, the objects to be treated are immersed in plasmas and then biased to negative potential. Consequently the plasma sheath forms and ion implantation may be performed. The pre-requirement of plasma implantation is that the object is conductive. So it seems difficult to treat the insulating materials. The paper focuses on the possibilities of plasma implantation into insulating materials and presents some examples.

Original languageEnglish
Pages (from-to)335-338
Number of pages4
JournalHe Jishu/Nuclear Techniques
Volume29
Issue number5
StatePublished - May 2006
Externally publishedYes

Keywords

  • Insulating materials
  • Plasma ion implantation
  • Plasma sheath
  • Surface charging

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