Abstract
Plasma immersion ion implantation (PHI) is an effective surface modification tool. During PHI processes, the objects to be treated are immersed in plasmas and then biased to negative potential. Consequently the plasma sheath forms and ion implantation may be performed. The pre-requirement of plasma implantation is that the object is conductive. So it seems difficult to treat the insulating materials. The paper focuses on the possibilities of plasma implantation into insulating materials and presents some examples.
| Original language | English |
|---|---|
| Pages (from-to) | 335-338 |
| Number of pages | 4 |
| Journal | He Jishu/Nuclear Techniques |
| Volume | 29 |
| Issue number | 5 |
| State | Published - May 2006 |
| Externally published | Yes |
Keywords
- Insulating materials
- Plasma ion implantation
- Plasma sheath
- Surface charging
Fingerprint
Dive into the research topics of 'Plasma immersion ion implantation into insulating materials'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver