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Piezoresistive properties of heavily doped p-type polysilicon films

  • Harbin Institute of Technology
  • Ministry of Education of the People's Republic of China
  • Shenyang University of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The different thickness polysilicon films were prepared by low pressure chemical vapor deposition. The microstructures of samples were observed by X-ray diffraction, scanning electron microscope and transmission electron microscope. The piezoresistive properties of samples were tested. The experimental results show that under high doping concentration, the gauge factor of polysilicon nanofilms is larger than that of common polysilicon films, which can not be explained reasonably by existing piezoresistive theories, but can be well explained by tunneling piezoresistive theory. The experimental results imply that the polysilicon nanofilms is a promising high temperature piezoresistive material.

Original languageEnglish
Title of host publication4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
Pages498-501
Number of pages4
DOIs
StatePublished - 2009
Event4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009 - Shenzhen, China
Duration: 5 Jan 20098 Jan 2009

Publication series

Name4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009

Conference

Conference4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
Country/TerritoryChina
CityShenzhen
Period5/01/098/01/09

Keywords

  • Gauge factors
  • Nanofilms
  • Piezoresistive property
  • Polysilicon
  • Tunneling piezoresistive theory

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