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Photoinduced Radical Emission in a Coassembly System

  • Yiran Li
  • , Glib V. Baryshnikov
  • , Chenggang Xu
  • , Hans Ågren
  • , Liangliang Zhu
  • , Tao Yi
  • , Yanli Zhao*
  • , Hongwei Wu*
  • *Corresponding author for this work
  • Donghua University
  • Fudan University
  • Linköping University
  • Uppsala University
  • Nanyang Technological University

Research output: Contribution to journalArticlepeer-review

Abstract

Developing radical emission at ambient conditions is a challenging task since radical species are unstable in air. In the present work, we overcome this challenge by coassembling a series of tricarbonyl-substituted benzene molecules with polyvinyl alcohol (PVA). The strong hydrogen bonds between the guest dopants and the PVA host matrix protect the free radicals of carbonyl compounds after light irradiation, leading to strong solid state free radical emission. Changing temperature and peripheral functional groups of the tricarbonyl-substituted benzenes can influence the intensity of the radical emission. Quantum-chemical calculations predict that such free radical fluorescence originates from anti-Kasha D2→D0 vertical emission by the anion radicals. The photoinduced radical emission by the tricarbonyl-substituted benzenes was successfully utilized for information encryption application.

Original languageEnglish
Pages (from-to)23842-23848
Number of pages7
JournalAngewandte Chemie - International Edition
Volume60
Issue number44
DOIs
StatePublished - 25 Oct 2021
Externally publishedYes

Keywords

  • anti-counterfeiting
  • coassembly
  • light emission
  • photoirradiation
  • radical luminescence

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