Optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios

Hongxin Shi; Changyu Ren; Suhua Luo; Qingxin Meng; Xiudong Sun

doi:10.1002/crat.201000305

Optical damage resistance of Hf:Fe:LiNbO₃ crystals with various [Li]/[Nb] ratios

Hongxin Shi^*
, Changyu Ren
, Suhua Luo
, Qingxin Meng
, Xiudong Sun

^*Corresponding author for this work

School of Physics

Heilongjiang University of Science and Technology
Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Hf:Fe:LiNbO₃ crystals were grown in air by the Czochralski technique with various [Li]/[Nb] ratios ([Li]/[Nb]=0.94, 1.05, 1.20) in melt. The defect structure and location of doped ions were analyzed by the UV-visible absorption spectra. The optical damage resistance of Hf:Fe:LiNbO₃ crystals was investigated by the photoinduced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO₃ crystals decreases with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO₃ crystals on the defect structure is discussed in detail. (

Original language	English
Pages (from-to)	931-934
Number of pages	4
Journal	Crystal Research and Technology
Volume	46
Issue number	9
DOIs	https://doi.org/10.1002/crat.201000305
State	Published - Sep 2011

Keywords

Hf:Fe:LiNbO crystals
[Li]/[Nb]
defect structure
optical damage resistance
ratio

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10.1002/crat.201000305

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title = "Optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios",

abstract = "Hf:Fe:LiNbO3 crystals were grown in air by the Czochralski technique with various [Li]/[Nb] ratios ([Li]/[Nb]=0.94, 1.05, 1.20) in melt. The defect structure and location of doped ions were analyzed by the UV-visible absorption spectra. The optical damage resistance of Hf:Fe:LiNbO3 crystals was investigated by the photoinduced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO3 crystals decreases with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO3 crystals on the defect structure is discussed in detail. (",

keywords = "Hf:Fe:LiNbO crystals, [Li]/[Nb], defect structure, optical damage resistance, ratio",

author = "Hongxin Shi and Changyu Ren and Suhua Luo and Qingxin Meng and Xiudong Sun",

year = "2011",

month = sep,

doi = "10.1002/crat.201000305",

language = "英语",

volume = "46",

pages = "931--934",

journal = "Crystal Research and Technology",

issn = "0232-1300",

publisher = "John Wiley \& Sons Inc.",

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}

TY - JOUR

T1 - Optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios

AU - Shi, Hongxin

AU - Ren, Changyu

AU - Luo, Suhua

AU - Meng, Qingxin

AU - Sun, Xiudong

PY - 2011/9

Y1 - 2011/9

N2 - Hf:Fe:LiNbO3 crystals were grown in air by the Czochralski technique with various [Li]/[Nb] ratios ([Li]/[Nb]=0.94, 1.05, 1.20) in melt. The defect structure and location of doped ions were analyzed by the UV-visible absorption spectra. The optical damage resistance of Hf:Fe:LiNbO3 crystals was investigated by the photoinduced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO3 crystals decreases with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO3 crystals on the defect structure is discussed in detail. (

AB - Hf:Fe:LiNbO3 crystals were grown in air by the Czochralski technique with various [Li]/[Nb] ratios ([Li]/[Nb]=0.94, 1.05, 1.20) in melt. The defect structure and location of doped ions were analyzed by the UV-visible absorption spectra. The optical damage resistance of Hf:Fe:LiNbO3 crystals was investigated by the photoinduced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO3 crystals decreases with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO3 crystals on the defect structure is discussed in detail. (

KW - Hf:Fe:LiNbO crystals

KW - [Li]/[Nb]

KW - defect structure

KW - optical damage resistance

KW - ratio

UR - https://www.scopus.com/pages/publications/80052102801

U2 - 10.1002/crat.201000305

DO - 10.1002/crat.201000305

M3 - 文章

AN - SCOPUS:80052102801

SN - 0232-1300

VL - 46

SP - 931

EP - 934

JO - Crystal Research and Technology

JF - Crystal Research and Technology

IS - 9

ER -

Optical damage resistance of Hf:Fe:LiNbO₃ crystals with various [Li]/[Nb] ratios

Abstract

Keywords

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