Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target

Qiang Xu; Yong Peng Zhao; Zhi Liang Guan; Ye Zhang; Qi Wang; Qi Li

doi:10.1109/RCSLPLT.2010.5615265

Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target

Qiang Xu^*
, Yong Peng Zhao
, Zhi Liang Guan
, Ye Zhang
, Qi Wang
, Qi Li

^*Corresponding author for this work

School of Astronautics

Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Abstract

The first capillary discharge produced plasma extreme ultraviolet source has been started in China. Fundamental characteristics of DPP including current, Xe gas pressure, extreme ultraviolet energy and spectrum in extreme ultraviolet region have been studied. A high voltage power source is employed, which voltage can be changed from 20kV to 30kV, and the current is from 25kA to 45kA with a FWHM of 120ns. The high voltage is loaded between the capillary which is 3mm in diameter and 12mm in length by injected Xe gas to achieve extreme ultraviolet radiation mostly in the region 10nm∼18nm developed in framework of an extreme ultraviolet lithograph program. It is founded that the in-band (13.5nm, 2% bandwidth) energy is increasing with decreasing Xe gas pressure and/or increasing the current in the region 5∼10Pa and 25kA∼45kA. And 0.56J/2π sr/pulse energy (13.5nm, 2% bandwidth) can be got when the input energy is 47.7J, and the conversion efficiency is 0.56%.

Original language	English
Title of host publication	2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010
Pages	213-216
Number of pages	4
DOIs	https://doi.org/10.1109/RCSLPLT.2010.5615265
State	Published - 2010
Event	2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010 - Harbin, China Duration: 28 Jul 2010 → 1 Aug 2010

Publication series

Name	2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010

Conference

Conference	2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010
Country/Territory	China
City	Harbin
Period	28/07/10 → 1/08/10

Keywords

13.5nm emission
Capillary discharge
EUV source
Extreme ultravilet lithograph
Xe discharge

Access to Document

10.1109/RCSLPLT.2010.5615265

Cite this

Xu, Q., Zhao, Y. P., Guan, Z. L., Zhang, Y., Wang, Q., & Li, Q. (2010). Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target. In 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010 (pp. 213-216). Article 5615265 (2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010). https://doi.org/10.1109/RCSLPLT.2010.5615265

Xu, Qiang ; Zhao, Yong Peng ; Guan, Zhi Liang et al. / Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target. 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010. 2010. pp. 213-216 (2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010).

@inproceedings{e15770d90c834c94a9b1670660b9d8d9,

title = "Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target",

abstract = "The first capillary discharge produced plasma extreme ultraviolet source has been started in China. Fundamental characteristics of DPP including current, Xe gas pressure, extreme ultraviolet energy and spectrum in extreme ultraviolet region have been studied. A high voltage power source is employed, which voltage can be changed from 20kV to 30kV, and the current is from 25kA to 45kA with a FWHM of 120ns. The high voltage is loaded between the capillary which is 3mm in diameter and 12mm in length by injected Xe gas to achieve extreme ultraviolet radiation mostly in the region 10nm∼18nm developed in framework of an extreme ultraviolet lithograph program. It is founded that the in-band (13.5nm, 2\% bandwidth) energy is increasing with decreasing Xe gas pressure and/or increasing the current in the region 5∼10Pa and 25kA∼45kA. And 0.56J/2π sr/pulse energy (13.5nm, 2\% bandwidth) can be got when the input energy is 47.7J, and the conversion efficiency is 0.56\%.",

keywords = "13.5nm emission, Capillary discharge, EUV source, Extreme ultravilet lithograph, Xe discharge",

author = "Qiang Xu and Zhao, \{Yong Peng\} and Guan, \{Zhi Liang\} and Ye Zhang and Qi Wang and Qi Li",

year = "2010",

doi = "10.1109/RCSLPLT.2010.5615265",

language = "英语",

isbn = "9781424455133",

series = "2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010",

pages = "213--216",

booktitle = "2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010",

note = "2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010 ; Conference date: 28-07-2010 Through 01-08-2010",

}

Xu, Q, Zhao, YP, Guan, ZL, Zhang, Y, Wang, Q & Li, Q 2010, Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target. in 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010., 5615265, 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010, pp. 213-216, 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010, Harbin, China, 28/07/10. https://doi.org/10.1109/RCSLPLT.2010.5615265

Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target. / Xu, Qiang; Zhao, Yong Peng; Guan, Zhi Liang et al.
2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010. 2010. p. 213-216 5615265 (2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target

AU - Xu, Qiang

AU - Zhao, Yong Peng

AU - Guan, Zhi Liang

AU - Zhang, Ye

AU - Wang, Qi

AU - Li, Qi

PY - 2010

Y1 - 2010

N2 - The first capillary discharge produced plasma extreme ultraviolet source has been started in China. Fundamental characteristics of DPP including current, Xe gas pressure, extreme ultraviolet energy and spectrum in extreme ultraviolet region have been studied. A high voltage power source is employed, which voltage can be changed from 20kV to 30kV, and the current is from 25kA to 45kA with a FWHM of 120ns. The high voltage is loaded between the capillary which is 3mm in diameter and 12mm in length by injected Xe gas to achieve extreme ultraviolet radiation mostly in the region 10nm∼18nm developed in framework of an extreme ultraviolet lithograph program. It is founded that the in-band (13.5nm, 2% bandwidth) energy is increasing with decreasing Xe gas pressure and/or increasing the current in the region 5∼10Pa and 25kA∼45kA. And 0.56J/2π sr/pulse energy (13.5nm, 2% bandwidth) can be got when the input energy is 47.7J, and the conversion efficiency is 0.56%.

AB - The first capillary discharge produced plasma extreme ultraviolet source has been started in China. Fundamental characteristics of DPP including current, Xe gas pressure, extreme ultraviolet energy and spectrum in extreme ultraviolet region have been studied. A high voltage power source is employed, which voltage can be changed from 20kV to 30kV, and the current is from 25kA to 45kA with a FWHM of 120ns. The high voltage is loaded between the capillary which is 3mm in diameter and 12mm in length by injected Xe gas to achieve extreme ultraviolet radiation mostly in the region 10nm∼18nm developed in framework of an extreme ultraviolet lithograph program. It is founded that the in-band (13.5nm, 2% bandwidth) energy is increasing with decreasing Xe gas pressure and/or increasing the current in the region 5∼10Pa and 25kA∼45kA. And 0.56J/2π sr/pulse energy (13.5nm, 2% bandwidth) can be got when the input energy is 47.7J, and the conversion efficiency is 0.56%.

KW - 13.5nm emission

KW - Capillary discharge

KW - EUV source

KW - Extreme ultravilet lithograph

KW - Xe discharge

UR - https://www.scopus.com/pages/publications/78649923466

U2 - 10.1109/RCSLPLT.2010.5615265

DO - 10.1109/RCSLPLT.2010.5615265

M3 - 会议稿件

AN - SCOPUS:78649923466

SN - 9781424455133

T3 - 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010

SP - 213

EP - 216

BT - 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010

T2 - 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010

Y2 - 28 July 2010 through 1 August 2010

ER -

Xu Q, Zhao YP, Guan ZL, Zhang Y, Wang Q, Li Q. Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target. In 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010. 2010. p. 213-216. 5615265. (2010 Academic Symposium on Optoelectronics and Microelectronics Technology and 10th Chinese-Russian Symposium on Laser Physics and Laser Technology, RCSLPLT/ASOT 2010). doi: 10.1109/RCSLPLT.2010.5615265

Observations and analysis of extreme ultraviolet emission by capillary discharge with Xe as target

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