TY - GEN
T1 - Natural organic matter removal by UV/chlorine process
T2 - 2013 International Conference on Advances in Energy and Environmental Science, ICAEES 2013
AU - Zhang, Xin Ran
AU - Li, Wei Guang
AU - Ren, Peng Fei
PY - 2013
Y1 - 2013
N2 - This study evaluated and optimized the UV/ chlorine process for natural organic matters (NOMs) removal using response surface methodology (RSM). The effects of both the primary and secondary interactions of the reaction variables, including initial chlorine concentration (X1), UV radiation time (X2) and pH value (X3), were examined. A satisfactory prediction response model (R2=0.999) was obtained, indicating the reliability of the methodology. The optimum condition obtained by CCD were 4.5 mg·L-1 initial chlorine concentration, 7 min UV radiation time and pH 6.7. Under the optical condition, the maximum TOC removal was 48% and TOC concentration was only 2.6 mg·L-1. The UV/ chlorine process as a novel AOP has many advantages for drinking water treatment, in terms of less chemical consumption, shorter reaction time and simpler technology.
AB - This study evaluated and optimized the UV/ chlorine process for natural organic matters (NOMs) removal using response surface methodology (RSM). The effects of both the primary and secondary interactions of the reaction variables, including initial chlorine concentration (X1), UV radiation time (X2) and pH value (X3), were examined. A satisfactory prediction response model (R2=0.999) was obtained, indicating the reliability of the methodology. The optimum condition obtained by CCD were 4.5 mg·L-1 initial chlorine concentration, 7 min UV radiation time and pH 6.7. Under the optical condition, the maximum TOC removal was 48% and TOC concentration was only 2.6 mg·L-1. The UV/ chlorine process as a novel AOP has many advantages for drinking water treatment, in terms of less chemical consumption, shorter reaction time and simpler technology.
KW - Advanced oxidation processes
KW - Central composite design
KW - Natural organic matters
KW - Numeral modeling
KW - Ultraviolet light
UR - https://www.scopus.com/pages/publications/84886836251
U2 - 10.4028/www.scientific.net/AMR.807-809.466
DO - 10.4028/www.scientific.net/AMR.807-809.466
M3 - 会议稿件
AN - SCOPUS:84886836251
SN - 9783037858622
T3 - Advanced Materials Research
SP - 466
EP - 471
BT - Environmental Protection and Resources Exploitation
Y2 - 30 July 2013 through 31 July 2013
ER -