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Nanoscratch profiles of hybrid films based on (3-glycidoxypropyl) trimethoxysilane and modified with tetraethoxysilane

  • L. Hu*
  • , X. Zhang
  • , Y. Huang
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Silsesquioxanes (SSO) derived from the hydrolytic condensation of (3-glycidoxypropyl)trimethoxysilane (GPMS) and tetraethoxysilane (TEOS) were prepared by the sol-gel process. Hardness H and elastic modulus E of the SSO films modified with 5, 10, 15, 20, 25 and 30 wt-%TEOS contents were measured by the continuous stiffness measurement technique and the brittle index H/E for the films was calculated from the results. The nanoscratch testing was carried out to study the influence of the different TEOS contents of the coatings on the scratch-testing profiles, including the pre-scan, scratch-scan and post-scan profiles. The film containing 20 wt-%TEOS was found to have the best elastoplastic behaviour and scratch resistance, based on considerations including the baseline of the pre-scan profile, the depth of the scratch, the abrupt change in the scratching curve and the fluctuation and recovering characteristic for the post-scan profile.

Original languageEnglish
Pages (from-to)457-461
Number of pages5
JournalPlastics, Rubber and Composites
Volume33
Issue number9-10
DOIs
StatePublished - 2004

Keywords

  • (3-Glycidoxypropyl)trimethoxysilane
  • Coefficient of friction
  • Nanoindentation
  • Nanoscratch
  • Silsesquioxanes
  • Sol-gel process
  • Tetraethoxysilane

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