Multiple ion-focusing effects in plasma immersion ion implantation

X. B. Tian; Paul K. Chu

doi:10.1063/1.1520716

Multiple ion-focusing effects in plasma immersion ion implantation

X. B. Tian
, Paul K. Chu^*

^*Corresponding author for this work

City University of Hong Kong

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.

Original language	English
Pages (from-to)	3744-3746
Number of pages	3
Journal	Applied Physics Letters
Volume	81
Issue number	20
DOIs	https://doi.org/10.1063/1.1520716
State	Published - 11 Nov 2002
Externally published	Yes

Access to Document

10.1063/1.1520716

Cite this

@article{0f559d1f55d643c2b9e4f7bedcb3bd3f,

title = "Multiple ion-focusing effects in plasma immersion ion implantation",

abstract = "The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.",

author = "Tian, \{X. B.\} and Chu, \{Paul K.\}",

year = "2002",

month = nov,

day = "11",

doi = "10.1063/1.1520716",

language = "英语",

volume = "81",

pages = "3744--3746",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "20",

}

TY - JOUR

T1 - Multiple ion-focusing effects in plasma immersion ion implantation

AU - Tian, X. B.

AU - Chu, Paul K.

PY - 2002/11/11

Y1 - 2002/11/11

N2 - The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.

AB - The multiple ion-focusing effects in plasma immersion ion implantation was discussed. A simple geometric model was presented for understanding the ion focusing effect and the ion dose uniformity. It was demonstrated that the ion focusing originates from plasma sheath convergence which depends on time and space. It was also found that the multiple ion focusing may occur at different local sites depending on the target shape and processing parameters.

UR - https://www.scopus.com/pages/publications/0037065104

U2 - 10.1063/1.1520716

DO - 10.1063/1.1520716

M3 - 文章

AN - SCOPUS:0037065104

SN - 0003-6951

VL - 81

SP - 3744

EP - 3746

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 20

ER -

Multiple ion-focusing effects in plasma immersion ion implantation

Abstract

Access to Document

Other files and links

Fingerprint

Cite this