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Multiple-grating self-correcting algorithm for processed mark measurement error

  • Tao Zhang
  • , Jiubin Tan*
  • , Jiwen Cui
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

When substrate is processed, also any measurement, grating marks available on the substrate, will be influenced: They will be deformed asymmetrically, which gives rise to an measurement-shift error when measuring such a grating mark. To measure on a processed mark, an algorithm is used. This algorithm describes a method to calculate the weight factor of the information from each order. The weight factors of such a algorithm are based on a model which describes the measurement position as a function of the diffraction orders and the mark position. This paper proposes a algorithm for finding these weight factors, and the feasibility of the method is validated through simulation.

Original languageEnglish
Title of host publicationNinth International Symposium on Precision Engineering Measurements and Instrumentation
EditorsXianfang Wen, Jiubin Tan
PublisherSPIE
ISBN (Electronic)9781628415612
DOIs
StatePublished - 2015
Event9th International Symposium on Precision Engineering Measurements and Instrumentation, ISPEMI 2014 - Changsha, China
Duration: 8 Aug 201410 Aug 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9446
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference9th International Symposium on Precision Engineering Measurements and Instrumentation, ISPEMI 2014
Country/TerritoryChina
CityChangsha
Period8/08/1410/08/14

Keywords

  • Processed mark measurement error
  • Self correcting algorithm

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