TY - GEN
T1 - Molecular Dynamics Simulation Study of the Degradation of Organic Contaminants by Energetic Reactive Species in Plasma
AU - Wang, Zixu
AU - Li, Yuhai
AU - Zhu, Mingzhi
AU - Wang, Baoxu
AU - Bai, Qingshun
AU - Zhang, Peng
N1 - Publisher Copyright:
© The Author(s), under exclusive license to Springer Nature Singapore Pte Ltd. 2025.
PY - 2025
Y1 - 2025
N2 - Current plasma cleaning technologies have been proven effective in removing organic contaminants from the surfaces of optical components; however, they still suffer from low cleaning efficiency and an uncontrollable cleaning process. The fundamental reason for these shortcomings lies in the lack of a profound understanding of the microscopic mechanisms by which plasma removes organic contaminants. Therefore, this study proposed using reactive molecular dynamics simulations to elucidate the microscopic physicochemical mechanisms through which energetic reactive species in plasma degrade organic contaminants. This research aims to investigate the microscopic reaction processes and the factors influencing plasma's cleaning efficiency in removing organic contaminants. Firstly, a physicochemical interaction model was constructed based on reactive force fields to describe the interactions between typical reactive oxygen species in plasma and representative organic contaminants in a vacuum system. The molecular-scale dynamics of bond breaking and reconfiguration, reaction products, and the mechanism of layer-by-layer removal during the plasma degradation of organic contaminants are described over picosecond timescales. Secondly, the study systematically discusses the effects of key cleaning parameters, such as plasma energy, plasma flux, and environmental temperature, on the removal efficiency of organic contaminants during plasma cleaning. The findings provide a theoretical foundation and technical support for enhancing the efficiency of plasma cleaning for organic contaminants on the surfaces of optical components and for controlling the cleaning process.
AB - Current plasma cleaning technologies have been proven effective in removing organic contaminants from the surfaces of optical components; however, they still suffer from low cleaning efficiency and an uncontrollable cleaning process. The fundamental reason for these shortcomings lies in the lack of a profound understanding of the microscopic mechanisms by which plasma removes organic contaminants. Therefore, this study proposed using reactive molecular dynamics simulations to elucidate the microscopic physicochemical mechanisms through which energetic reactive species in plasma degrade organic contaminants. This research aims to investigate the microscopic reaction processes and the factors influencing plasma's cleaning efficiency in removing organic contaminants. Firstly, a physicochemical interaction model was constructed based on reactive force fields to describe the interactions between typical reactive oxygen species in plasma and representative organic contaminants in a vacuum system. The molecular-scale dynamics of bond breaking and reconfiguration, reaction products, and the mechanism of layer-by-layer removal during the plasma degradation of organic contaminants are described over picosecond timescales. Secondly, the study systematically discusses the effects of key cleaning parameters, such as plasma energy, plasma flux, and environmental temperature, on the removal efficiency of organic contaminants during plasma cleaning. The findings provide a theoretical foundation and technical support for enhancing the efficiency of plasma cleaning for organic contaminants on the surfaces of optical components and for controlling the cleaning process.
KW - Energetic active particle
KW - Organic contaminant
KW - Plasma cleaning
KW - Reactive molecular dynamics
UR - https://www.scopus.com/pages/publications/105019515381
U2 - 10.1007/978-981-96-5711-7_25
DO - 10.1007/978-981-96-5711-7_25
M3 - 会议稿件
AN - SCOPUS:105019515381
SN - 9789819657100
T3 - Springer Proceedings in Physics
SP - 311
EP - 324
BT - Proceedings of the 5th Chinese Conference on High Voltage and Discharge Plasmas - HVDP 2024
A2 - Li, Yongdong
A2 - Sun, Anbang
A2 - Xu, Ming
A2 - Zhang, Jiawei
PB - Springer Science and Business Media Deutschland GmbH
T2 - 5th Chinese Conference on High Voltage and Discharge Plasmas, HVDP 2024
Y2 - 29 November 2024 through 1 December 2024
ER -