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Microstructure development and morphological transition during deposition of immiscible alloy films

  • Yong Lu*
  • , Benjamin Derby
  • , Hariharan Sriram
  • , Kamal Kadirvel
  • , Cuiping Wang
  • , Xingjun Liu
  • , Amit Misra
  • , Yunzhi Wang
  • *Corresponding author for this work
  • Xiamen University
  • Ohio State University
  • University of Michigan, Ann Arbor

Research output: Contribution to journalArticlepeer-review

Abstract

Complex three-dimensional microstructural patterns arise during deposition of immiscible alloys and their morphologies depend sensitively on alloy composition, deposition rates and substrate temperatures. Using phase field simulations, we construct a microstructure morphology map in a multi-dimensional space of material properties and processing parameters. We consider simultaneous effects from temperature-dependent surface and bulk diffusivities and thermodynamic driving force for phase separation, temperature- and composition-dependent interphase boundary and surface energies, as well as alloy composition, substrate temperature and deposition rate. The microstructural patterns and morphological transition sequences in as-deposited films revealed by the microstructure map are validated using experimental data from sputtered Cu-Mo alloy films as well as from other systems. Such a microstructural map can guide synthesis of three-dimensional compositionally modulated nanostructures via self-organization during deposition of immiscible alloy films.

Original languageEnglish
Article number117313
JournalActa Materialia
Volume220
DOIs
StatePublished - Nov 2021
Externally publishedYes

Keywords

  • Immiscible alloy
  • Microstructural patterns
  • Phase-field method
  • Thin films

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