Microstructure characteristics of steel M50 implanted with nitrogen by plasma-based ion implantation at elevated temperature

Shuyan Xu; Xinxin Ma; Mingren Sun; Yue Sun; Ken Yukimura

doi:10.1016/j.nimb.2005.08.041

Microstructure characteristics of steel M50 implanted with nitrogen by plasma-based ion implantation at elevated temperature

Shuyan Xu
, Xinxin Ma^*
, Mingren Sun
, Yue Sun
, Ken Yukimura

^*Corresponding author for this work

Harbin Institute of Technology
Doshisha University

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Steel M50 was modified by plasma-based ion implantation (PBII) at different temperatures. The results of scanning electron microscope (SEM) indicate that PBII at elevated temperature can reduce both grain size of substrate and precipitates in the implanted layer and remove the network microstructure of carbides in the substrate. Glancing angle X-ray diffraction (GXRD) analysis indicates that the elevated temperature is in favor of the formation of nitrides. The diffraction peaks of nitrides are obvious when the temperature is higher than 300 °C with implantation voltage of 25 kV.

Original language	English
Pages (from-to)	374-376
Number of pages	3
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	242
Issue number	1-2
DOIs	https://doi.org/10.1016/j.nimb.2005.08.041
State	Published - Jan 2006
Externally published	Yes

Keywords

Elevated temperature
Microstructure
PBII
Steel

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10.1016/j.nimb.2005.08.041

Cite this

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title = "Microstructure characteristics of steel M50 implanted with nitrogen by plasma-based ion implantation at elevated temperature",

abstract = "Steel M50 was modified by plasma-based ion implantation (PBII) at different temperatures. The results of scanning electron microscope (SEM) indicate that PBII at elevated temperature can reduce both grain size of substrate and precipitates in the implanted layer and remove the network microstructure of carbides in the substrate. Glancing angle X-ray diffraction (GXRD) analysis indicates that the elevated temperature is in favor of the formation of nitrides. The diffraction peaks of nitrides are obvious when the temperature is higher than 300 °C with implantation voltage of 25 kV.",

keywords = "Elevated temperature, Microstructure, PBII, Steel",

author = "Shuyan Xu and Xinxin Ma and Mingren Sun and Yue Sun and Ken Yukimura",

year = "2006",

month = jan,

doi = "10.1016/j.nimb.2005.08.041",

language = "英语",

volume = "242",

pages = "374--376",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier B.V.",

number = "1-2",

}

Microstructure characteristics of steel M50 implanted with nitrogen by plasma-based ion implantation at elevated temperature. / Xu, Shuyan; Ma, Xinxin; Sun, Mingren et al.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 242, No. 1-2, 01.2006, p. 374-376.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Microstructure characteristics of steel M50 implanted with nitrogen by plasma-based ion implantation at elevated temperature

AU - Xu, Shuyan

AU - Ma, Xinxin

AU - Sun, Mingren

AU - Sun, Yue

AU - Yukimura, Ken

PY - 2006/1

Y1 - 2006/1

N2 - Steel M50 was modified by plasma-based ion implantation (PBII) at different temperatures. The results of scanning electron microscope (SEM) indicate that PBII at elevated temperature can reduce both grain size of substrate and precipitates in the implanted layer and remove the network microstructure of carbides in the substrate. Glancing angle X-ray diffraction (GXRD) analysis indicates that the elevated temperature is in favor of the formation of nitrides. The diffraction peaks of nitrides are obvious when the temperature is higher than 300 °C with implantation voltage of 25 kV.

AB - Steel M50 was modified by plasma-based ion implantation (PBII) at different temperatures. The results of scanning electron microscope (SEM) indicate that PBII at elevated temperature can reduce both grain size of substrate and precipitates in the implanted layer and remove the network microstructure of carbides in the substrate. Glancing angle X-ray diffraction (GXRD) analysis indicates that the elevated temperature is in favor of the formation of nitrides. The diffraction peaks of nitrides are obvious when the temperature is higher than 300 °C with implantation voltage of 25 kV.

KW - Elevated temperature

KW - Microstructure

KW - PBII

KW - Steel

UR - https://www.scopus.com/pages/publications/28644435452

U2 - 10.1016/j.nimb.2005.08.041

DO - 10.1016/j.nimb.2005.08.041

M3 - 文章

AN - SCOPUS:28644435452

SN - 0168-583X

VL - 242

SP - 374

EP - 376

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 1-2

ER -

Microstructure characteristics of steel M50 implanted with nitrogen by plasma-based ion implantation at elevated temperature

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Keywords

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