Microstructural stability and mechanical property of AlCrFeMoTi high-entropy amorphous alloy thin films under He⁺ ions irradiation

High-entropy amorphous materials have recently proved exceptional radiation resistance, showing potential as a candidate materials for nuclear industry applications. This study synthesized nearly equi-atomic AlCrFeMoTi high-entropy amorphous thin films with a thickness of about 499 nm using magnetron sputtering. The prepared films were subjected to low dose, 0.5 MeV He⁺ ion irradiation, with varying irradiation damage ranging from 0.01 to 0.1 displacement per atom (dpa). Increasing the irradiation dose led to a decrease in the radius of the inner diffraction halo (r) and an increase in the crystal-like order, indicating an irradiation-induced structural relaxation process within the amorphous matrix. This relaxation results in more efficient atomic packing, yielding a denser amorphous structure and enhanced hardness of AlCrFeMoTi high-entropy amorphous thin films. This study demonstrates that AlCrFeMoTi high-entropy amorphous thin films exhibit remarkable radiation resistance, with stable microstructure and mechanical properties under He⁺ irradiation, making them promising candidates for applications in the nuclear industry.